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| | TANTALUM NITRIDE Basic information |
| | TANTALUM NITRIDE Chemical Properties |
| | TANTALUM NITRIDE Usage And Synthesis |
| Chemical Properties | Hexagonal, brown, bronze, or black
crystals. Insoluble in
water; slightly soluble in aqua regia, nitric acid,
hydrogen fluoride. | | Uses | Tantalum nitride is used to create barrier or "glue" layers between copper, or other conductive metals, and dielectric insulator films such as thermal oxides. These films are deposited on top of silicon wafers during the manufacture of integrated circuits, to create thin film surface mount resistors and has other electronic applications. | | Production Methods | Tantalum nitride, TaN, is produced by direct synthesis of the elements at 1,100 °C (2,012 °F). Very pure TaN has been produced by spontaneous reaction of lithium amide, LiNH2, and TaCl5 . The compound is often added to cermets in 3–18 wt %. Ta3N5 is used as a red pigment in plastics and paints. |
| | TANTALUM NITRIDE Preparation Products And Raw materials |
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